2 edition of Investigations in the vacuum ultraviolet of a steady state nitrogen plasma found in the catalog.
We investigated Xe – N 2 gas discharge primarily as a source of vacuum ultraviolet for florescent lamps. The discharge performances of Xe based nitrogen admixture gas are improved when compared with the results of pure Xe discharge. The experimental results come from investigating the Xe positive column and were determined by measuring the infrared radiation during the discharge operation. As in any discipline, understanding the underlying scientific principles has profound practical implications when properly understood. In this series of articles, we will review the first principles of vacuum technology and explain them using real-world illustrations. Most industrial vacuum systems can, in broad-based terms, be categorized in terms of low (i.e., “soft”), medium, high (i.e.
Ultraviolet light with wavelengths in the – nm range (known as the vacuum ultraviolet; VUV) has applications in nanofabrication, photochemistry and spectroscopy, to . Atmospheric and Vacuum Plasma Treatments Where σ iz is the ionization cross section (cm2), and v is the mean velocity of the free electrons (cm/s). Listed in Table are the ioniza-tion thresholds and cross sections for helium, argon, nitrogen and oxygen [7,9,12–18]. The cross sections have been evaluated at 30 eV, which corre-.
Other articles where Vacuum-ultraviolet radiation is discussed: spectroscopy: Broadband-light sources: intense sources of ultraviolet and vacuum-ultraviolet radiation, and so excitation in an electron discharge remains a common method for this portion of the spectrum. (The term vacuum ultraviolet refers to the short-wavelength portion of the electromagnetic spectrum where the photons are. Simultaneous measurement of nitrogen and hydrogen dissociation from vacuum ultraviolet self-absorption spectroscopy in a developing low temperature plasma at atmospheric pressure George Laity, Andrew Fierro, James Dickens, Andreas Neuber, and Klaus Frank Citation: Appl. Phys. Lett. , (); doi: /
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Beam, Investigations in the Vacuum Ultraviolet of a Steady State Nitrogen Plasma, Naval Postgraduate School Thesis (). Brown and C. Watson-Munro, Plasma Physics 9, (). NASA Glenn Research Center at Lewis Field designed and developed a steady state vacuum ultraviolet automated (SSVUVa) facility with in situ VUV intensity calibration capability.
The automated feature enables a constant accelerated VUV radiation exposure over long periods of testing without breaking vacuum. OBSERVATIONS ON THE VACUUM ULTRAVIOLET SPECTRUM OF ATOMIC NITROGEN EMITTED FROM THE MICROWAVE-DRIVEN DISCHARGE. Iowa State University of Science and Technology Ph.D., Chemistry, physical University Microfilms, Inc., Ann Arbor, Michigan.
feasibility of obtaining vacuum ultraviolet spectral data from an arc- jet plasma. The vacuum ultraviolet (VUV) is that o portion of the elec- tromagnetic spectrum extending from to 10 A; however, this effort was restricted to the range from to A.
Although the spectroscopy of high-enthalpy gas flows is not new, this is believedFile Size: 1MB. vacuum ultraviolet photochemistry. unimolecular decomposition studies of small hydrocarbon clusters by molecular beam photoionization mass spectrometry.
photofragment dynamics study of carbon disulfide by high resolution molecular beam laser photofragment time-of-flight mass spectrometry iowa state university ph.d. We have developed a vacuum ultraviolet absorption spectroscopy (VUVAS) technique employing a high-pressure nitrogen molecule (N 2) microdischarge hollow cathode lamp (N 2 MHCL) as a light source of the atomic nitrogen (N) resonance lines for Cited by: Ammonia gas diluted with nitrogen was used as the NO removal agent, which was fed into the photochemical reactor at room temperature.
Flow rates of NH 3 and N 2 gas were adjusted by MFCs, and both gases were completely mixed by the gas blender. The absorption coefficient of molecular ammonia is 59 atm −1 cm −1 at nm, implying that molecular ammonia is excited by photons emitted from Cited by: 7.
Vacuum ultraviolet radiation is among the space environment elements that can be hazardous to DC silicone film, which has been proposed for use on spacecraft exterior surfaces.
We have developed a vacuum ultraviolet absorption spectroscopy (VUVAS) technique employing a high-pressure nitrogen molecule (N2) microdischarge hollow cathode lamp (N2 MHCL) as a light source of the atomic nitrogen (N) resonance lines for measuring absolute N densities in process plasmas.
The estimations of self-absorption and the emission line profiles of the N2 MHCL. The steady state sputter yield observed at P> Pa, despite the increase in F radical concentration indicates the dominant role of ion bombardment in this etch regime, while at P.
Some Aspects of Vacuum Ultraviolet Radiation Physics presents some data on the state of research in vacuum ultraviolet radiation in association with areas of physics.
Organized into four parts, this book begins by elucidating the optical properties of solids in the vacuum ultraviolet region (v.u.v.), particularly the specific methods of.
James Carlin Beam has written: 'Investigations in the vacuum ultraviolet of a steady state nitrogen plasma' -- subject(s): Physics Asked in Science, Jobs & Education, Physics What are different.
The compact measurement system for absolute density of oxygen (O) atom has been developed, which employs a vacuum ultraviolet absorption spectroscopy (VUVAS) technique with a high-pressure microdischarge hollow cathode lamp (MHCL) as a light source.
The influences of self-absorption, emission line profile of the MHCL, and background absorption of oxygen molecule (O 2). Abstract We have measured the refractivity of nitrogen gas in the ultraviolet and vacuum ultraviolet using a Fourier transform spectrometer.
A new two-term Sellmeier formula for the standard refractivity between nm and nm is derived. vacuum and nitrogen purging in the far-UV, technicians carried out tests using a McPherson / vacuum spectrometer, a Model deuterium lamp light source and a Model photomultiplier tube de-tector.
A typical instrument is shown in Figure 1. For both purged and vacuum measure-ments, emission spectra of the deute. Vacuum Science and Technology. Most CVD, Epitaxy and Plasma processes use vacuum.
Vacuum. Vacuum Ultraviolet Spectroscopy II (Volume 32) (Experimental Methods in the Physical Sciences (Volume 32)) [Lucatorto, Thomas, De Graef, Marc, Samson, James A., Ederer, David L.] on *FREE* shipping on qualifying offers.
Vacuum Ultraviolet Spectroscopy II (Volume 32) (Experimental Methods in the Physical Sciences (Volume 32)). Refractivity of nitrogen gas in the vacuum ultraviolet. Griesmann U, Burnett J. We have measured the refractivity of nitrogen gas in the ultraviolet and the vacuum ultraviolet, using a Fourier-transform spectrometer.
A new two-term Sellmeier formula for the standard refractivity between and nm is derived. Effects of plasma and vacuum-ultraviolet exposure on the mechanical properties of low-k porous organosilicate glass X. Guo,1 J. Jakes,2 S. Banna,3 Y. Nishi,4 and J. Shohet1 1Plasma Processing & Technology Laboratory and Department of Electrical and Computer Engineering, University of Wisconsin-Madison, Madison, WisconsinUSA.
The mechanism of action on biomolecules of N₂ gas plasma, a novel sterilization technique, remains unclear. Here, the effect of N₂ gas plasma on protein structure was investigated. BSA, which was used as the model protein, was exposed to N₂ gas plasma generated by short-time high voltage pulses from a static induction thyristor power supply.
The vacuum ultraviolet to visible emission from SWD plasmas in pure hydrogen or 7%H 2 in Ar mixture has been investigated over a broad range of excitation frequency (50⩽f⩽ MHz) using a spectrophotometer with a known transfer function.A hydrogen plasma with intense extreme ultraviolet and visible emission was generated from low pressure hydrogen gas (–1 mbar) in contact with a hot tungsten filament only when the filament heated a titanium dissociator coated with K 2 CO 3 above °C.
The electric field strength from the filament was about 1 V cm −1, two orders of magnitude lower than the starting voltages measured.In this article, the electron ionization temperature in plasmas generated by nm laser pulses in the vacuum ultraviolet spectral range is evaluated as a function of the axial distance from a.